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Research Article Open access CC BY 4.0

Effect of Cold Plasma Seed Treatment on Physiological and Biochemical Changes in Aged Mustard Seed Variety-RH0749

Harish M.S., Sandeep Yadav, Bharat Taindu Jain

Journal of Advances in Biology & Biotechnology · pp. 975–982 · Published 2 May 2024

10.9734/jabb/2024/v27i51052

Abstract

The low rate of seed germination is a major problem in modern agriculture. Cold-activated air plasma has been tested as a pre-treatment method to improve the rate and uniformity of the germination. In view of the widespread cultivation of mustard in India and other parts of the world, This study was conducted to determine alternative non-destructive seed treatment method based on cold plasma chemistry would offer a more viable alternative over traditional seed coating technologies Seed physiological characteristics as was modified in aged low vigour mustard seeds by coating the surface of the seeds with cold plasma process using a rotating plasma reactor during 2023-24 at CCS HAU, College of Agriculture  Bawal. The source of atmospheric oxygen gas, nitrogen and heliun gas entering the plasma chamber during the reaction process determined the type of coating.  Among the different treatments imposed, seed treatment with 300V at 10  Min significantly enhanced seed quality attributes viz., germination ( 92 %), root length ( 4.37 cm), shoot length ( 6.98 cm), mean seedling length (11.0 cm ), Seedling dry weight (2.67 mg) and SVI-I (1115), SVI-II (254), TDH (0.78 A480 nm) with lower electrical conductivity (14.20 dsm-1). The inhibitory effect noticed with a higher dose of plasma of 400v at 10 min suggested the need for judicious usage of these plasma frequencies in such applications. The first-ever report on the effect of new plasma state on seed germination and establishment of mustard revealed the positive influence that could be used as a seed treatment to enhance seed yield and quality.

Cold plasma mustard seed germination seed vigour

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Cited by 1

Boosting Seed Performance with Cold Plasma

M. A. Benabderrahim, Imen Bettaieb, M. Rejili · Applied Sciences · 2025

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